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Scattering mechanisms in textured FeGe thin films: magnetoresistance and the anomalous Hall effect

机译:织构FeGe薄膜的散射机制:磁电阻和磁电阻   霍尔效应异常

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摘要

A textured thin film of FeGe was grown by magnetron sputtering with ahelimagnetic ordering temperature of TN = 276 +/- 2 K. From 5 K to roomtemperature a variety of scattering processes contribute towards the overalllongitudinal and Hall resistivities. These were studied by combiningmagnetometry and magnetotransport measurements. The high-fieldmagnetoresistance (MR) displays three clear temperature regimes: Lorentz forceMR dominates at low temperatures, above T ~ 80 K scattering from spin-wavespredominates, whilst finally for T > 200 K scattering from fluctuating localmoments describes the MR. At low fields, where the magnetisation is no longertechnically saturated, we find a scaling of magnetoresistance with the squareof the magnetisation, indicating that the MR due to the unwinding of spins inthe conical phase arises from a similar mechanism to that in magnetic domainwalls. This MR is only visible up to a temperature of about 200 K. No featurescan be found in the temperature or field dependence of the longitudinalresistivity that belie the presence of the underlying magnetic phase transitionat TN: the marked changes in behavior are at much lower temperatures. Theanomalous Hall effect has a dramatic temperature dependence in which theanomalous Hall resistivity scales quadratically with the longitudinalresistivity: comparison with anomalous Hall scaling theory shows that oursystem is in the intrinsic 'moderately dirty' regime. Lastly, we find evidenceof a topological Hall effect of size 100 ~Ohm cm.
机译:通过磁控溅射以TN = 276 +/- 2 K的等磁有序温度生长FeGe的织构薄膜。从5 K到室温,各种散射过程有助于总的纵向和霍尔电阻率。这些是通过结合磁力测量法和磁传输测量法进行研究的。高场磁阻(MR)显示三个清晰的温度范围:洛伦兹力MR在低温下占主导地位,在自旋波的T〜80 K散射以上占主导地位,最后,对于T> 200 K,波动局部矩的散射描述了MR。在低磁场下,磁化强度不再达到技术饱和,我们发现磁阻随磁化强度的平方成比例变化,这表明,由于锥形相中自旋的展开而引起的MR的产生机理与磁畴壁相似。该MR仅在最高约200 K的温度下才可见。在纵向电阻率的温度或磁场相关性中找不到任何特征,即在TN处存在潜在的磁性相变:行为的显着变化是在更低的温度下。异常霍尔效应具有显着的温度依赖性,其中异常霍尔电阻率与纵向电阻率呈二次方比例变化:与异常霍尔比例理论的比较表明,我们的系统处于固有的“中度脏污”状态。最后,我们发现大小为100〜Ohm cm的拓扑霍尔效应的证据。

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